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Image courtesy of Will Seberger/Arizona Daily Wildcat
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The group's research focus is the
process chemistry that occurs at solid surfaces. The surfaces
of interest are part of materials used to build integrated circuits
and optical devices. Most of the current work is on gas/solid
surface reactions important in the manufacture of silicon-based
integrated circuits. The goals of the research are to discover
the sequence of chemical steps and measure kinetic parameters
for novel cleaning, deposition, and etching reactions. The results
will be used to conceive of process technologies that advance device
performance while minimizing the environmental impact of manufacturing.
Project areas include gas, supercritical,
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| and liquid phase cleaning, high k and copper seed/barrier layer deposition, and optical materials etching. The research tools available in the laboratory
consist of a gas phase cluster tool for integrated processing, supercritical
fluid reactor, plasma reactor with Langmuir probe diagnostic, and
surface analysis spectroscopies (XPS, Auger, scanning Auger, FTIR,
TPD/TPRS, and ellipsometry). The laboratory is part of the Arizona
Microelectronics Laboratory, which is a student-centered, class
100 facility with additional shared resources. |
This website was last updated
9/27/2004
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